Method for temperature measurement of semiconducting substrates

Details Method for temperature measurement of semiconducting substrates Method for temperature measurement of semiconducting substrates

1994-09-13

1997-11-04

Gutierrez, Diego F. F.

Thermal measuring and testing

Temperature measurement

Nonelectrical, nonmagnetic, or nonmechanical temperature...

374120, G01K 1100

Patent

active

056831803

ABSTRACT:
A method and apparatus for enabling the use of optical techniques for temperature measurement of a semiconducting substrate coated with an optically opaque overlayer. A reflective mirror structure is inserted between the semiconducting substrate and the optically opaque overlayer. The reflective structure prevents the overlayer from absorbing light transmitted through the semiconducting substrate and instead reflects the light, thereby restoring the substrate front-surface reflectivity required for temperature measurement analysis by optical techniques such as absorption edge reflectance spectroscopy.

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Weilmeier, M.K. et al., "A New Optical Temperature Measurement Technique for Semiconductor Substrates in Molecular Beam Epitaxy," Can. J. Phys., vol. 69, pp. 422-426 (1991).

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