Method for symmetric deposition of metal layer

Details Method for symmetric deposition of metal layer Method for symmetric deposition of metal layer

2006-01-18

2009-06-30

Le, Dung A. (Department: 2818)

Semiconductor device manufacturing: process

Coating with electrically or thermally conductive material

To form ohmic contact to semiconductive material

C438S620000, C438S618000, C438S508000

Reexamination Certificate

active

07553755

ABSTRACT:
A method for symmetric deposition of metal layer over a metal layer registration key comprises using MOCVD to form the metal layer. Once the symmetric metal layer is formed, a metal layer registration key can be accurately detected and the metal layer registration key overlay shift can be improved.

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