Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Removal of imaged layers
Patent
1997-06-03
1999-05-04
Codd, Bernard
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Removal of imaged layers
134 1, 134 19, 134 21, G03C 500, B08B 312, B08B 700
Patent
active
059003510
ABSTRACT:
It has been discovered that organic photoresists may be quickly, coveniently, and completely stripped using a hot hydrogen atmosphere. The substrates are preferably exposed to such atmosphere utilizing a hydrogen conveyor furnace. The gases from the furnace are burned to carbon dioxide and water thereby eliminating the need to dispose of a stripping agent.
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Lutsic Rebecca Christine
Murray James Richard
Sissenstein, Jr. David William
Codd Bernard
International Business Machines - Corporation
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