Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1990-02-01
1991-09-03
Nguyen, Nam X.
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419215, 2041922, C23C 1434
Patent
active
050451650
ABSTRACT:
A carbon film for protecting a magnetic disk is sputtered in the presence of hydrogen. If a sufficient amount of hydrogen is present in the sputtering chamber, the resulting carbon film will exhibit superior mechanical characteristics, i.e. an enhanced wear resistance during a contact-start-stop or drag test in a disk drive. Sputtering in the presence of hydrogen can be accomplished by either DC or RF magnetron sputtering, or DC or RF diode sputtering.
REFERENCES:
patent: 4778582 (1988-10-01), Howard
R. Ahlert et al., "A wear resistant coating", Research Disclosure, 9/1986, No. 269.
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"Tribology and Mechanics of Magnetic Storage Devices", B. Bhushan, published by Springer-Verlag, 1990, pp. 144-156 and 632-674.
"Structure and Morphology of RF Sputtered Carbon Overlayer Films", S. Agarwal, IEEE Transactions on Magnetics, vol. MAG-21, No. 5, Sep., 1985, pp. 1257-1259.
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"Wear Characteristic Dependence of Carbon Overcoats on Target Material", Eitan Ziera et al., IEEE Transaction on Magnetics, vol. 26, No. 1, Jan., 1990, pp. 179-180.
Komag, Inc.
Nguyen Nam X.
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