Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1995-02-17
1997-05-13
Garrett, Felisa C.
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419226, 20415715, 427446, 117 89, 117 92, C23C 1410
Patent
active
056288824
ABSTRACT:
System and method for plasma-assisted deposition of optically transparent, crystalline chromium/carbon/fluorine films are described using a chromium metal source and an argon/fluorocarbon plasma. The films were optically transparent to the unaided eye. Characterization of the material by electron diffraction showed the chromium/carbon/fluorine material to be crystalline.
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O'Keefe Matthew J.
Rigsbee J. Michael
Garrett Felisa C.
Kundert Thomas L.
Scearce Bobby D.
The United States of America as represented by the Secretary of
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