Method for simultaneously coating a plurality of filaments

Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma

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Other Related Categories

427569, B05D 306

Type

Patent

Status

active

Patent number

054319684

Description

ABSTRACT:
Methods and apparatuses for coating materials, and the products and compositions produced thereby. Substances, such as diamond or diamond-like carbon, are deposited onto materials, such as a filament or a plurality of filaments simultaneously, using one or more cylindrical, inductively coupled, resonator plasma reactors.

REFERENCES:
patent: 4368092 (1983-01-01), Steinberg et al.
patent: 4402993 (1983-09-01), Aisenberg et al.
patent: 4530750 (1985-07-01), Aisenberg et al.
patent: 4742012 (1988-05-01), Matsumura
patent: 4918031 (1990-04-01), Flamm et al.
Cook, J. M., et al, "Application of a Low-Pressure Radio Frequency Discharge Source to Polysilicon Gate Etching," J. Vacuum Science Technology, B8(1), pp. 1-4 (1990). (No month available).
Rudder, R. A., et al, "Direct Deposition of Polycrystalline Diamond Films on Si(100) Without Surface Pretreatment," Applied Physics Letters, vol. 59, pp. 791-793 (1991). (No month available).
Hsu, W., "Diamond Coatings," Advanced Manufacturing Technologies, Sandia Technology, pp. 10-11 (Mar. 1993).
Advertisement Prototech Research, Inc., the ES-RF Resonator Plasma Source (4 sheets) (No date avail.).

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