Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Reexamination Certificate
2004-11-01
2008-10-07
Huff, Mark F. (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
C430S313000
Reexamination Certificate
active
07432039
ABSTRACT:
A method of fabricating a pattern on a surface of a substrate includes applying at least one non-molecular lithographic technique with at least one molecular lithographic technique to simultaneously define a size and shape of at least one of the features of the pattern. The pattern includes a nanoscale gap between features, the gap having a width defined by the thickness of one or more molecular layers used in one of the molecular lithographic techniques.
REFERENCES:
patent: 7015062 (2006-03-01), Weiss et al.
patent: 2004/0110350 (2004-06-01), Pang et al.
Hatzor et al., “Molecular Rulers for Scaling Down Nanostructures”, Science, vol. 291, pp. 1019-1020 (2001).
McCarty, Gregory S., Molecular Lithography for Wafer Scale Fabrication of Molecular Junctions:, currently under review.
McCarty, Gregory S., “Charge Transport of Molecular Films Elucidated by Nanofabricated Junctions”, published Aug. 2004.
Catchmark Jeffrey M.
Lavallee Guy P.
Mc Carty Gregory S.
Huff Mark F.
McKee Voorhees & Sease, P.L.C.
Sullivan Caleen O
The Penn State Research Foundation
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