Method for sequencing substrates

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Grooved and refilled with deposited dielectric material

Reexamination Certificate

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C257SE21525

Reexamination Certificate

active

11271242

ABSTRACT:
Methods for transferring substrates in a system with a factory interface robot between at least one FOUP, a buffer coupled to a parasitic device and an inbound and outbound transfer station coupled to a processing tool are provided. In one embodiment, a method for transferring substrates includes transferring a first substrate on an end effector of a robot from a FOUP to a buffer station serving a parasitic device, moving the substrate from the buffer station into the parasitic device, picking up a second substrate on the end effector, compensating for a residence time of the first substrate in the parasitic device, transferring the second substrate to parasitic device from the end effector to the buffer station serving the parasitic device, and picking up the first substrate from the buffer station.

REFERENCES:
patent: 5944857 (1999-08-01), Edwards et al.
patent: 6244931 (2001-06-01), Pinson et al.
patent: 6352467 (2002-03-01), Somekh et al.
patent: 6696367 (2004-02-01), Aggarwal et al.
patent: 7010388 (2006-03-01), Mitchell et al.
patent: 2001/0024877 (2001-09-01), Vepa et al.
patent: 2003/0045131 (2003-03-01), Verbeke et al.
patent: 2005/0113964 (2005-05-01), van der Meulen
patent: 2005/0113976 (2005-05-01), van der Meulen
patent: 2006/0246683 (2006-11-01), Pan et al.
patent: 1 020 893 (2000-07-01), None
PCT International Search Report and Written Opinion dated Jul. 6, 2006 for PCT/US2005/042169.

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