Method for SEM measurement of topological features

Radiant energy – Inspection of solids or liquids by charged particles – Methods

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C250S311000

Reexamination Certificate

active

06768111

ABSTRACT:

FIELD OF THE INVENTION
The field of the invention is the field of measurement of topological features on the surface of a substrate, principally but not limited to using focused electron beams and ion beams.
OBJECTS OF THE INVENTION
It is an object of the invention to produce a method of determining the topography of a surface of a substrate, particularly where the substrate has no sharp contrasts in material, crystallography, or angle.
It is an object of the invention to produce a method of determining the focusing conditions for an electron or an ion beam to focus the beam on a surface of a substrate, particularly where the substrate has no sharp contrasts in material, crystallography, or angle.
It is an object of the invention to produce a method of determining the depth of features in a generally flat, otherwise featureless surface.
It is an object of the invention to produce a method of determining features of sidewalls of a hole or trench in a substrate, particularly when the sidewall is sloped, vertical or undercut.
SUMMARY OF THE INVENTION
A focused particle bean, such as an electron, ion, atom, or molecular bean is directed on to the surface of a substrate. Scattered particles which travel in a straight line from the surface irradiated are collected in a particle detector. A particle blocking material having an edge is interposed between the surface and the particle detector, and the location of the shadow cast by the edge of the material is measured. The relative position of the surface and the edge casting the shadow can then be determined. Sweeping the particle beam can then be used to build up a topographic map of the surface. The depth and the sidewalls of holes and trenches are measured by appropriately changing the angle of incidence of the particle beam.


REFERENCES:
patent: 4683376 (1987-07-01), Feuerbaum
patent: 6452176 (2002-09-01), Davis
patent: 6566655 (2003-05-01), Choo et al.
patent: 2003/0064571 (2003-04-01), Takeda et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for SEM measurement of topological features does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for SEM measurement of topological features, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for SEM measurement of topological features will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3187226

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.