Method for selectively etching integral cathode substrate and su

Details Method for selectively etching integral cathode substrate and su Method for selectively etching integral cathode substrate and su

1980-11-25

1984-04-10

Hess, Bruce H.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

1566591, 156660, C23F 102, H01L 21312

Patent

active

044419570

ABSTRACT:
In a method for preparing an integral cathode substrate and support in which selected surface portions of a formed metal part are masked, the unmasked surface portions etched, and then the mask removed, the improvement wherein the masking step is conducted by pressing surface portions of an etch-resistant, compressible sheet against the selected surface portions of the part.

REFERENCES:
patent: 3432900 (1969-03-01), Kerstetter
patent: 4155801 (1979-05-01), Provancher
RCA Technical Notes TN No. 1159, 7/1976, (Turnbull).

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