Method for selective deposition of metal thin film

Details Method for selective deposition of metal thin film Method for selective deposition of metal thin film

1987-11-30

1989-05-16

Childs, Sadie

Coating processes

Coating by vapor, gas, or smoke

Metal coating

427255, 4272551, C23C 1608

Patent

active

048308919

ABSTRACT:
A metal thin film is deposited on predetermined portions of an underlayer of a substrate by a chemical deposition method with good selectivity, good reproducibility and high deposition rate by preventing hydrogen atoms from the adhesion to portions of the substrate not to be deposited with a metal using a special means for heating only the substrate or a special gas flow controlling means.

REFERENCES:
patent: 3697342 (1972-10-01), Cuomo
patent: 3697343 (1972-10-01), Cuomo et al.
patent: 4181758 (1980-01-01), Elam
patent: 4321073 (1982-03-01), Blair
patent: 4496609 (1985-01-01), McNeilly et al.
patent: 4540607 (1985-09-01), Tsao
patent: 4584207 (1986-04-01), Wilson
patent: 4595608 (1986-06-01), King et al.
patent: 4741928 (1988-05-01), Wilson et al.

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