Method for scrubbing and cleaning substrate

Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...

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Details

134 7, 134 6, 134 26, 134 32, 134 33, B08B 100, B08B 302, B08B 312, B08B 702

Patent

active

055185525

ABSTRACT:
A substrate scrubbing and cleaning method in which a substrate is carried to a rotatable scrubbing arrangement, and both surfaces of the substrate are scrubbed by the rotatable scrubbing arrangement while the substrate is maintained substantially horizontal. In addition, a cleaning solution is applied to both surfaces of the substrate while the substrate is substantially horizontal and is linearly reciprocated.

REFERENCES:
patent: 3479222 (1969-11-01), David et al.
patent: 4109337 (1978-08-01), Hillman et al.
patent: 4178188 (1979-12-01), Dussault et al.
patent: 5092011 (1992-03-01), Gommori et al.

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