Method for removing borosilicate and boron rich oxides from a si

Details Method for removing borosilicate and boron rich oxides from a si Method for removing borosilicate and boron rich oxides from a si

1980-12-03

1982-02-02

Massie, Jerome W.

Metal treatment

Process of modifying or maintaining internal physical...

Chemical-heat removing or burning of metal

156653, 156663, 156628, 427344, H01L 21225, H01L 21306

Patent

active

043137733

ABSTRACT:
A method for doping silicon bodies by the diffusion of boron into the bodies is described. The method is an improvement of processes where the silicon bodies are exposed in a first heating process to a gas mixture containing a predetermined boron quantity and boron and oxygen in a predetermined quantitative ratio and a second heating process is used to drive the boron into the silicon. In the method, a borosilicate glass layer and a boron-rich silicon dioxide layer are removed by first immersing the silicon body in hydrofluoric acid diluted with water and subsequently in an aqueous sulfuric acid/potassium permanganate solution.

REFERENCES:
patent: 2847287 (1958-08-01), Landgren
patent: 3061495 (1962-10-01), Alford
patent: 3669775 (1972-06-01), Porter
patent: 3751314 (1973-08-01), Rankel
patent: 3784424 (1974-01-01), Chang
patent: 4249970 (1981-02-01), Briska et al.

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