Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board
Patent
1997-01-03
1999-06-01
Beck, Shrive
Coating processes
Electrical product produced
Integrated circuit, printed circuit, or circuit board
427 99, 427255, 4272557, 4273766, 438592, B05D 512, B05D 302, C23C 1642
Patent
active
059086599
ABSTRACT:
The present invention discloses a method for reducing the reflectivity of a silicide layer. This invention utilizes a rapid thermal oxidation process to treat a tungsten silicide film in order to reduce the reflectivity of the tungsten silicide film. Thus, an anti-reflectivity layer is not required in the present invention. In addition simplify the present invention, a thin oxide layer is growth on the tungsten suicide layer during the rapid thermal oxidation process and the thin oxide layer serves as a hard mask in subsequent steps. In addition, because utilizing the rapid thermal process, the present invention can greatly reduce the resistance of the tungsten silicide in order to increase the speed of the devices.
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Huang Yui-Ping
Lo Yung-Tsun
Ni Chyi-Tsong
Tsai Cheng-Hsun
Beck Shrive
Chen Bret
Mosel Vitelic Inc.
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