Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1998-05-28
2000-08-15
Duda, Kathleen
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430313, G03F 726
Patent
active
061034576
ABSTRACT:
Disclosed is a method for reducing faceting of a photoresist layer during an etch process. The method includes depositing a metallization layer on a semiconductor substrate, and forming a photoresist layer over at least a portion of the metallization layer. The method also includes treating the photoresist layer with a first plasma so as to harden the photoresist layer against a metal etching plasma. The method further includes exposing the metallization layer and the photoresist layer to the metal etching plasma. The metal etching plasma etches the metallization layer at a substantially faster rate than the treated photoresist layer so that faceting on the photoresist layer is substantially reduced.
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Duda Kathleen
Philips Electronics North America Corp.
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