Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
Reexamination Certificate
2006-05-01
2008-12-02
Kebede, Brook (Department: 2894)
Semiconductor device manufacturing: process
Coating of substrate containing semiconductor region or of...
Insulative material deposited upon semiconductive substrate
C438S798000
Reexamination Certificate
active
07459403
ABSTRACT:
In microelectronic circuits involving dielectric/semiconductor interfaces having interstitial sites in the dielectric, a method for hardening these interfaces by introducing a small atomic diameter inert gas into the interstitial sites.
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Devine Roderick A. B.
Hughes Harold L.
Revesz Akos G.
Callahan Kenneth E.
Kebede Brook
The United States of America as represented by the Secretary of
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