Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate
2006-03-29
2010-12-28
Sarkar, Asok K (Department: 2891)
Semiconductor device manufacturing: process
Coating with electrically or thermally conductive material
To form ohmic contact to semiconductive material
C438S584000, C257SE21170, C427S537000
Reexamination Certificate
active
07858522
ABSTRACT:
A method for introducing a precursor vapor to a process chamber configured for forming a thin film on a substrate is described. The method includes transporting a process gas containing metal precursor vapor and a CO delivery gas to a process chamber, and introducing a CO saturation gas to the precursor vapor in the process chamber and optionally adjusting the spatial distribution of the CO saturation gas addition in order to affect improvements to the properties of the deposited film.
REFERENCES:
patent: 4851895 (1989-07-01), Green et al.
patent: 5171610 (1992-12-01), Liu
patent: 6303809 (2001-10-01), Chi et al.
patent: 6319832 (2001-11-01), Uhlenbrock et al.
patent: 6440495 (2002-08-01), Wade et al.
patent: 6444263 (2002-09-01), Paranjpe et al.
patent: 6605735 (2003-08-01), Kawano et al.
patent: 6713373 (2004-03-01), Omstead
patent: 2003/0129306 (2003-07-01), Wade et al.
patent: 2004/0105934 (2004-06-01), Chang et al.
patent: 2005/0070100 (2005-03-01), Yamasaki et al.
patent: 2005/0081882 (2005-04-01), Greer et al.
patent: 2005/0110142 (2005-05-01), Lane et al.
patent: 2005/0186341 (2005-08-01), Hendrix et al.
C. Czekaj et al., Chemical Vapor Deposition of FeCox and FeCoxOy, Thin Films from Fe-Co Carbonyl Clusters, Inorg. Chem. 1988, 27, pp. 8-10.
Gomi Atsushi
Suzuki Kenji
Sarkar Asok K
Slutsker Julia
Tokyo Electron Limited
Wood Herron & Evans LLP
LandOfFree
Method for reducing carbon monoxide poisoning in a thin film... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for reducing carbon monoxide poisoning in a thin film..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for reducing carbon monoxide poisoning in a thin film... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4179376