Method for reducing an equivalent resistance in an IC layout

Details Method for reducing an equivalent resistance in an IC layout Method for reducing an equivalent resistance in an IC layout

2007-08-14

2007-08-14

Dinh, Paul (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000, C716S030000, C716S030000, C716S030000

Reexamination Certificate

active

10924505

ABSTRACT:
A method of the invention is used for checking the via density between two adjacent layers of an IC layout. The method includes selecting a first metal layer and a second metal layer, wherein the first metal layer is adjacent to the second one, each of the metal layers has at least a wire, and the metal layers are coupled to each other through at least a first via; calculating the cross-sectional area of the first via and the overlapping area of the overlapped part of the wires in the first and the second metal layers; and disposing at least a second via in the overlapped part to couple the first and the second metal layers if the ratio of the cross-sectional area to the overlapping area is smaller than a predetermined ratio value.

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