Radiation imagery chemistry: process – composition – or product th – Registration or layout process other than color proofing
Patent
1997-05-01
1999-01-12
Young, Christopher G.
Radiation imagery chemistry: process, composition, or product th
Registration or layout process other than color proofing
430312, 430314, 430316, 430318, G03F 900
Patent
active
058585885
ABSTRACT:
A mask pattern and method are described for the recovery of alignment marks on an integrated circuit wafer without the use of additional masks. The mask pattern and method provide means to recover the alignment marks after forming a metal layer on a planarized inter-level dielectric layer. The pattern which conventional methods have placed on a separate mask is formed in the end regions of a mask used for forming a pattern on the active region of the wafer. In order to fit the pattern in the end regions of the mask the pattern is divided into two parts. When the pattern is used to expose a layer of photoresist two exposure steps are used.
REFERENCES:
patent: 4768883 (1988-09-01), Waldo et al.
patent: 5271798 (1993-12-01), Sandhu et al.
Chang Jui-Yu
Chen Chunshing
Chen Ying-Ho
Jang Syun-Ming
Ackerman Stephen B.
Prescott Larry J.
Saile George O.
Taiwan Semiconductor Manufacturing Company , Ltd.
Young Christopher G.
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