Method for recognizing and avoiding etch-critical regions

Details Method for recognizing and avoiding etch-critical regions Method for recognizing and avoiding etch-critical regions

2005-08-09

2005-08-09

Garbowski, Leigh M. (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000, C716S030000

Reexamination Certificate

active

06928627

ABSTRACT:
In a method for recognizing etch-critical regions, the critical regions are already determined in the layout under the processor control dependent on the fabrication-oriented rules and are automatically rectified in the existing layout, so that under-etchings are avoided in the following etching procedures.

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Handbuch der Leiterplattentechnik, vol. 2, Neu Verfahren, Neu Technologien, 1991, pp. 22-37.

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