Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
Reexamination Certificate
2006-06-20
2006-06-20
Ahmed, Shamim (Department: 1765)
Etching a substrate: processes
Gas phase etching of substrate
Application of energy to the gaseous etchant or to the...
C216S002000, C216S017000, C216S018000, C216S057000, C216S083000, C438S689000, C438S733000, C438S734000
Reexamination Certificate
active
07063798
ABSTRACT:
A process is presented for realizing buried microchannels (10) in an integrated structure (1) comprising a monocrystalline silicon substrate (2). The process forms in the substrate (2) at least one trench (4). A microchannel (10) is obtained starting from a small surface port of the trench (4) by anisotropic etching of the trench. The microchannel (10) is then completely buried in the substrate (2) by growing a microcrystalline structure to enclose the small surface port.
REFERENCES:
patent: 4685198 (1987-08-01), Kawakita
patent: 4993143 (1991-02-01), Sidner
patent: 5429734 (1995-07-01), Gajar
patent: 6153488 (2000-11-01), Yoshino
patent: 6376291 (2002-04-01), Barlocchi
patent: 6406982 (2002-06-01), Urakami et al.
patent: 6426254 (2002-07-01), Kudelka et al.
patent: 6582987 (2003-06-01), Jun et al.
patent: 2001/0049200 (2001-12-01), Erratico et al.
patent: 2002/0086456 (2002-07-01), Cunningham et al.
patent: 2002/0132421 (2002-09-01), Schrems
patent: 1 043 770 (2000-10-01), None
patent: 1 067 599 (2001-01-01), None
patent: 1 073 112 (2001-01-01), None
patent: WO 01/61750 (2001-08-01), None
European Search Report, 02425746.1, dated Jul. 15, 2003.
Arena Guiseppe
D'arrigo Guiseppe Alessio M.
Lorenti Simona
Spinella Rosario C.
Ahmed Shamim
Jenkens & Gilchrist PC
STMicroelectronics S.r.l.
LandOfFree
Method for realizing microchannels in an integrated structure does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for realizing microchannels in an integrated structure, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for realizing microchannels in an integrated structure will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3695382