Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Patent
1993-10-25
1994-11-15
Pianalto, Bernard
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
4272553, 427296, 4273981, 427574, 427579, 427598, B05D 314, B05D 306
Patent
active
053646657
ABSTRACT:
A plasma treating apparatus is useful for coating substrates with thin films having vapor barrier properties at relatively rapid deposition rates. The apparatus comprises an evacuable chamber, an electrically powered electrode defining a plasma-facing surface within the chamber, and a shield spaced a distance .DELTA. transverse to the plasma-facing surface. During plasma treatments, the plasma is confined to within distance .DELTA. while a substrate is continuously fed through the confined plasma.
REFERENCES:
patent: 3898952 (1975-08-01), Shirahata et al.
patent: 4277516 (1981-07-01), Behn et al.
patent: 4384918 (1983-05-01), Abe
patent: 4400410 (1983-08-01), Green et al.
patent: 4551310 (1985-11-01), Imada et al.
patent: 4557946 (1985-12-01), Sacher et al.
patent: 4559112 (1985-12-01), Tamamura et al.
patent: 4599678 (1986-07-01), Wertheimer et al.
patent: 4741801 (1988-05-01), Coleman
patent: 4842707 (1989-06-01), Kinoshita
patent: 4847469 (1989-07-01), Hofmann et al.
patent: 4863756 (1989-09-01), Hartig et al.
patent: 4920917 (1990-05-01), Nakatani et al.
patent: 4960073 (1990-10-01), Suzuki et al.
patent: 4968918 (1990-11-01), Kondo et al.
patent: 4986890 (1991-01-01), Setoyama et al.
patent: 4991542 (1991-02-01), Kohmura et al.
patent: 4997519 (1991-05-01), Kondo et al.
patent: 5009738 (1991-04-01), Gruenwald et al.
patent: 5013416 (1991-05-01), Murayama et al.
patent: 5041304 (1991-08-01), Kusano et al.
Chatham, III Hood
Countrywood Joseph
Felts John T.
Nelson Robert J.
Cassett Larry R.
Draegert David A.
Pianalto Bernard
The BOC Group Inc.
LandOfFree
Method for rapid plasma treatments does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for rapid plasma treatments, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for rapid plasma treatments will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1095964