Method for purification of hydrofluoric acid

Chemistry of inorganic compounds – Halogen or compound thereof – Hydrogen halide

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423488, 423341, 423545, C01B 722, C01C 124, C01B 3300

Patent

active

040566056

ABSTRACT:
A method for purification of hydrofluoric acid from silicofluoric acid and/or sulphuric acid which comprises contacting a mixture of said acids with an anion-exchange resin in the fluoride form. As a result, a purified hydrofluoric acid is obtained. The exhausted anion-exchange resin is treated with a regenerating solution which comprises an aqueous solution of ammonium fluoride with a concentration within the range of from 2 to 10% by weight and having a pH value ranging from 6 to 9.
The method according to the present invention is technologically simple; it enables the use of tightly sealed and safe equipment; requires minimal operation costs and eliminates the formation of production wastes.

REFERENCES:
patent: 3383324 (1968-05-01), Hiwatashi
Chem. Abstracts, vol. 70, 1969, p. 113, Item 116678b.

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