Method for purification of etching solution

Details Method for purification of etching solution Method for purification of etching solution

1994-09-15

1995-11-28

Hruskoci, Peter A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

210750, 210753, 210765, 210766, H01L 21306

Patent

active

054704219

ABSTRACT:
A method for purifying an etching solution consisting of an aqueous phosphoric acid solution which has been used in etching of a silicon nitride film. In the process, hydrogen fluoride is added to an etching solution consisting of an aqueous phosphoric acid solution which has been used for etching of a silicon nitride film, and the resulting solution is heated to remove fluorides of silicon as reaction products of hydrogen fluoride with silicon compounds which have been contained in the etching solution together with vaporized water.

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patent: 4971654 (1990-11-01), Schnegg et al.
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