Method for pulsed-plasma enhanced vapor deposition

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427 58, 4272481, 4272556, 427535, 427569, 427585, 437225, C08F 246

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059853751

ABSTRACT:
A novel method for pulsed-plasma enhanced chemical vapor deposition ("PPECVD") is described. A power-modulated energy waveform is provided to a gas in a reactor chamber to generate a pulsed-plasma for PPECVD. The power-modulated energy waveform is amplitude-modulated by a beat frequency caused by interfering signals. The product of the interfering signals is a continuous, amplitude modulated signal, in which a beat frequency waveform may have either a sinusoidal form or a non-sinusoidal form. Beat frequency is selected such that a characteristic thickness of a material to be deposited may or may not be not be deposited in a single period of the beat frequency.

REFERENCES:
patent: 3940506 (1976-02-01), Heinecke
patent: 4073669 (1978-02-01), Heinecke et al.
patent: 4328261 (1982-05-01), Heinecke et al.
patent: 4433012 (1984-02-01), Heinecke et al.
patent: 4460618 (1984-07-01), Heinecke et al.
patent: 4684535 (1987-08-01), Heinecke et al.
patent: 4749589 (1988-06-01), Heinecke et al.
patent: 4824690 (1989-04-01), Heinecke et al.
patent: 4935661 (1990-06-01), Heinecke
patent: 5344792 (1994-09-01), Sandhu et al.
patent: 5362526 (1994-11-01), Wang et al.
"Preparation of Amorphous Multilayer Films by Pulsed Plasma and Photo (PPP) CVD Method", Report of the Research Laboratory of Engineering Materials, Nagatsuta, Yokohama 227, Japan, No. 14, 1989. (no month avail.).
Low-temperature pulsed plasma deposition. II. The production of novel amorphous compounds of germanium in thin film, Journal of Vacuum Science & Technology A, vol. 7, No. 3, pt. 1, pp. 1099-104, 1989. (no month avail.).
"Low temperature pulsed plasma deposition. Part I--a new technique for thin film deposition with complete gas dissociation", Vacuum, vol. 38, Nos. 8-10, pp. 627 to 63, 1988. (no month avail.).
Surface Coatings & Technology, 102(1998) 35-40, "The time Development of pulsed-DC production plasmas used for deposition of TiN" by K.S. Mogensen et al. (no month avail.).

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