Semiconductor device manufacturing: process – Semiconductor substrate dicing – Having specified scribe region structure
Reexamination Certificate
2009-02-19
2011-10-18
Lee, Calvin (Department: 2892)
Semiconductor device manufacturing: process
Semiconductor substrate dicing
Having specified scribe region structure
C257S797000
Reexamination Certificate
active
08039366
ABSTRACT:
A method and apparatus includes an integrated circuit device, and at least one alignment mark on the integrated circuit device, the alignment mark comprises a first coded region, a second coded region adjacent the first coded region, and a third coded region adjacent the second coded region, the second coded region located between the first coded region and the third coded region, and markings on the first coded region and the third coded region being identical.
REFERENCES:
patent: 5521036 (1996-05-01), Iwamoto et al.
patent: 6071656 (2000-06-01), Lin
patent: 6190807 (2001-02-01), Wang et al.
patent: 6384899 (2002-05-01), Den Boef
patent: 6961116 (2005-11-01), Den Boef et al.
patent: 7099010 (2006-08-01), Schulz
patent: 7099011 (2006-08-01), McArthur et al.
patent: 7112813 (2006-09-01), Den Boef et al.
patent: 7170604 (2007-01-01), Sezginer et al.
patent: 7218400 (2007-05-01), Ho et al.
patent: 7283236 (2007-10-01), Presura et al.
patent: 7319506 (2008-01-01), Den Boef et al.
patent: 7330261 (2008-02-01), Van Haren et al.
patent: 7332732 (2008-02-01), Van Bilsen et al.
patent: 7405025 (2008-07-01), Yaegashi et al.
patent: 7863763 (2011-01-01), Van Haren et al.
Holloway Karen L.
LaFerrara Holly
Martin Alexander L.
Powell Martin E.
Wiltshire Timothy J.
Gibb I.P. Law Firm LLC
International Business Machines - Corporation
Lee Calvin
Li, Esq. Wenjie
LandOfFree
Method for providing rotationally symmetric alignment marks... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for providing rotationally symmetric alignment marks..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for providing rotationally symmetric alignment marks... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4266891