Method for providing an operable filter system for filtering...

Details Method for providing an operable filter system for filtering... Method for providing an operable filter system for filtering...

2005-12-27

2008-08-19

Berman, Jack I. (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S50400H, C250S3960ML, C250S492100, C355S030000, C318S119000

Reexamination Certificate

active

07414251

ABSTRACT:
A method for providing an operable filter system for filtering particles out of a beam of radiation in lithography is disclosed. The method includes providing a slack foil or wire for intercepting the particles, mounting at least a first point or side of the foil or wire to a first position of a mounting assembly, and substantially stretching the slack foil or wire at least within the beam of radiation, substantially parallel to a direction in which the radiation propagates.

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