Method for providing a design pattern on a metal stencil and met

Details Method for providing a design pattern on a metal stencil and met Method for providing a design pattern on a metal stencil and met

1988-05-13

1990-08-07

Michl, Paul R.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making printing plates

430311, 430945, 1011784, 250318, G03F 712

Patent

active

049467638

ABSTRACT:
The present invention relates to a method for forming a pattern in a metal stencil or screen which is covered by a covering layer in the form of a resist material. The pattern is formed by locally removing the lacquer or resist from the screen's perforations with the use of a beam of high energy radiation such as a laser beam. The resist material used is filled to a high concentration with metal powder to increase its thermal conductivity. The present invention also relates to a metal stencil provided with such a metal-filled covering layer which is patternable with the use of a radiation beam.

REFERENCES:
patent: 2500617 (1950-03-01), Meigs
patent: 3226256 (1965-12-01), Schneble, Jr. et al.
patent: 3696742 (1972-10-01), Parts et al.
patent: 3981237 (1976-09-01), Rhodes
patent: 4411980 (1983-10-01), Henry et al.
patent: 4670351 (1987-06-01), Keane et al.

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