Method for producing smooth indium-tin-oxide layers on...

Details Method for producing smooth indium-tin-oxide layers on... Method for producing smooth indium-tin-oxide layers on...

2006-05-09

2006-05-09

Coleman, W. David (Department: 2823)

Semiconductor device manufacturing: process

Coating with electrically or thermally conductive material

To form ohmic contact to semiconductive material

C438S104000, C257S040000

Reexamination Certificate

active

07041588

ABSTRACT:
In a method for producing ITO layers on substrates, especially for the production of organic light-emitting diodes, part of the ITO layer thickness is applied first by sputter-deposition, at a controlled temperature profile, in such manner that the formation of crystallization nuclei is prevented; subsequently, the partially coated substrate is heated to a temperature above the recrystallization temperature of the ITO layer, and then the rest of the ITO layer is sputter-deposited.

REFERENCES:
patent: 02189816 (1990-07-01), None
patent: 07078526 (1995-03-01), None

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