Method for producing smooth, dense optical films

Details Method for producing smooth, dense optical films Method for producing smooth, dense optical films

2006-08-25

2008-12-16

Hoang, Quoc D (Department: 2892)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

Insulative material deposited upon semiconductive substrate

C257SE21478

Reexamination Certificate

active

07465681

ABSTRACT:
The invention is directed to preparing optical elements having a thin, smooth, dense coating or film thereon, and a method for making such coating or film. The coated element has a surface roughness of <1.0 nm rms. The coating materials include hafnium oxide or a mixture of hafnium oxide and another oxide material, for example silicon dioxide. The method includes the use of a reverse mask to deposit the coating or film on a rotating substrate.

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