Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1993-04-02
1994-09-20
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430275, 430277, 430278, 430326, 430327, 430330, 430331, 430967, G03F 732, G03F 738, G03F 740
Patent
active
053488423
ABSTRACT:
A photosensitizer comprising a diazo ester of benzolactone ring compound, such as phenolphthalein or cresolphthalein as the backbone, where at least one of the hydroxy groups on benzolactone ring has been esterified with diazo-sulfonyl chloride consisting of 60 to 100 mole % 2,1,4 or 2,1,5-diazo sulfonyl chloride or a mixture thereof, and a photoresist comprising an admixture of the photosensitizer, which is present in the photoresist composition in an amount sufficient to uniformly photosensitize the photoresist composition; a water insoluble, aqueous alkali soluble novolak resin, the novolak resin being present in the photoresist composition in an amount sufficient to form a substantially uniform photoresist composition and a suitable solvent.
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Patent Abstracts of Japan, vol. 11, No. 093 (P-559) Mar. 24, 1987 & JP,A,61 245 154 (Dainippon Ink & Chem. Inc.) Oct. 31, 1985 (see abstract).
Dammel Ralph R.
Khanna Dinesh N.
McKenzie Douglas
Sobodacha Chester J.
Bowers Jr. Charles L.
Hoechst Celanese Corporation
Sayko Jr. Andrew F.
Young Christopher G.
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