Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
Reexamination Certificate
2005-08-26
2008-10-07
Picardat, Kevin M (Department: 2822)
Semiconductor device manufacturing: process
Coating of substrate containing semiconductor region or of...
Insulative material deposited upon semiconductive substrate
C438S781000, C438S960000
Reexamination Certificate
active
07432218
ABSTRACT:
A process of a porous body comprises the steps of disposing a first material in which pores are formed by anodization on a substrate to form a first layer, disposing on the first layer a second material which has a hardness lower than that of the first material and an oxide of which is dissolved by an anodization step to form a second layer, forming a concave structure on a surface of the second layer, oxidizing the second layer, and subjecting the first layer to anodization to dissolve the second layer.A magnetic recording medium or a light-emitting element comprises a first layer which is comprised of an oxide of aluminum and comprises a porous portion on a substrate, and a second layer on the first layer which has a hardness lower than that of the first layer and is comprised of a metal element, wherein the pores are packed with a magnetic substance or a light-emitting material.
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Den Tohru
Imada Aya
Canon Kabushiki Kaisha
Fitzpatrick ,Cella, Harper & Scinto
Picardat Kevin M
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