Method for producing patterns in a polymer layer

Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma

Reexamination Certificate

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C427S577000, C427S578000, C427S579000, C427S588000

Reexamination Certificate

active

07846512

ABSTRACT:
A method for producing patterns in a polymer layer. Polymer sites are formed on a support. These sites are subjected to a plasma deposition of dielectric material and preferably react with this plasma so as to form openings at the level of said sites. A pattern structure is then formed in the dielectric material and/or in the polymer.

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French Patent Application No. FR 07 02218, filed Mar. 27, 2007.

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