Method for producing optical film

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate

Reexamination Certificate

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C438S781000

Reexamination Certificate

active

07064086

ABSTRACT:
The present invention relates to a method for producing an optical film, the optical film having the same molecule length in X-axis, Y-axis and Z-axis orientation, comprising the steps of: stretching the optical film along the X-axis; fixing the length of the optical film along the Y-axis; heating the optical film to above an extension temperature; shrinking the optical film along the X-axis; stretching the optical film along the Z-axis; and enabling the molecule length of the optical film along the X-axis to be longer than that along the Z-axis while the molecule length of the optical film along the Z-axis is longer than that along the Y-axis.

REFERENCES:
patent: 5509464 (1996-04-01), Turner et al.
patent: 6673425 (2004-01-01), Hebrink et al.
patent: 6697195 (2004-02-01), Weber et al.
patent: 6788463 (2004-09-01), Merrill et al.
patent: 6827886 (2004-12-01), Neavin et al.
patent: 6830713 (2004-12-01), Hebrink et al.
patent: 6888675 (2005-05-01), Ouderkirk et al.
patent: 6891589 (2005-05-01), Hata et al.
patent: 6905220 (2005-06-01), Wortman et al.
patent: 6916440 (2005-07-01), Jackson et al.
patent: 6936209 (2005-08-01), Jackson et al.

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