Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
Reexamination Certificate
2006-06-20
2006-06-20
Lebentritt, Michael (Department: 2812)
Semiconductor device manufacturing: process
Coating of substrate containing semiconductor region or of...
Insulative material deposited upon semiconductive substrate
C438S781000
Reexamination Certificate
active
07064086
ABSTRACT:
The present invention relates to a method for producing an optical film, the optical film having the same molecule length in X-axis, Y-axis and Z-axis orientation, comprising the steps of: stretching the optical film along the X-axis; fixing the length of the optical film along the Y-axis; heating the optical film to above an extension temperature; shrinking the optical film along the X-axis; stretching the optical film along the Z-axis; and enabling the molecule length of the optical film along the X-axis to be longer than that along the Z-axis while the molecule length of the optical film along the Z-axis is longer than that along the Y-axis.
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Lee Kuang-Rong
Lin Hung-Yuan
Wang Bor-Ping
Lebentritt Michael
Lindsay Jr. Walter L.
Optimax Technology Corporation
Troxell Law Office PLLC
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