Method for producing high silicon steel strip in a continuously

Details Method for producing high silicon steel strip in a continuously Method for producing high silicon steel strip in a continuously

1988-09-22

1992-02-18

Sheehan, John P.

Metal treatment

Process of modifying or maintaining internal physical...

Magnetic materials

148113, H01F 104

Patent

active

050890611

ABSTRACT:
The present invention relates to a method for producing high silicon steel strip in a continuous treatment line through chemical vapor deposition (called "CVD" hereinafter), wherein the steel strip is subjected continuously to siliconization at temperatures between 1023.degree. and 1200.degree. C. by CVD in a non-oxidizing gas atmosphere containing SiCl.sub.4 between 5% and 35% in molar fraction. Subsequently a diffusion treatment is performed in a non-oxidizing gas atmosphere not containing SICl.sub.4 for diffusing Si uniformly throughout the steel strip, which is then cooled and coiled. If required, the steel strip may be coated with an insolating film and subjected to a baking treatment, before cooling and coiling.

REFERENCES:
patent: 3423253 (1969-01-01), Ames et al.

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