Method for producing fine structure for electronic device

Details Method for producing fine structure for electronic device Method for producing fine structure for electronic device

1993-08-20

1994-12-13

Powell, William

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156652, 156655, 1566591, 156662, 437126, 437234, H01L 21306, B44C 122

Patent

active

053726758

ABSTRACT:
In a method for producing a fine semiconductor structure, a first layer is formed on a second layer, an etching-resistant mask is formed on the first layer, the second layer is etched in an etchant to form a desired shape thereof, a composition of the first layer is different from a composition of the second layer, and at least one of boundary surfaces of the etching-resistant mask and the first layer facing to each other is substantially prevented from including another substance which is different from both of the etching-resistant mask and the first layer.

REFERENCES:
patent: 4675074 (1987-06-01), Wada et al.
patent: 5034344 (1991-07-01), Jewell et al.
patent: 5236864 (1993-08-01), Iga et al.
patent: 5266518 (1993-11-01), Binsma et al.
C. Juang, et al, "Selective etching of GaAs and Al.sub.0.30 Ga.sub.0.70 As with citric acid/hydrogen peroxide solutions", J. Vac. Sci. Technol. B8(5), Sep./Oct. 1990, pp. 1122-1124.
M. Notomi, et al, "Clear energy level shift in ultranarrow In GaAs/InP quantum well wires fabricated by reverse mesa chemical etching", Appl. Phys. Lett. 58(7), Feb. 18, 1991, pp. 720-722.
T. Katoh, et al, "Fabrication of ultrafine gratings on GaAs by electron beam lithography and two-step wet chemical etching", Appl. Phys. Lett. 57(12), Sep. 17, 1990, pp. 1212-1214.

Affiliated with

Also associated with

Rating

Method for producing fine structure for electronic device does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for producing fine structure for electronic device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for producing fine structure for electronic device will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1191042