Method for producing fine-grained particles

Details Method for producing fine-grained particles Method for producing fine-grained particles

2006-12-22

2010-06-01

Malsawma, Lex (Department: 2892)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

Insulative material deposited upon semiconductive substrate

C423S593100

Reexamination Certificate

active

07727909

ABSTRACT:
A method for producing complex metal oxide having nano-sized grains that includes the steps of forming a mixture containing at least one metal cation dissolved in a solution and particulate material containing at least one further metal in the form of metal(s) or metal compound(s) and treating the mixture to form the complex metal oxide having nano-sized grains. The at least one further metal from the particulate material becomes incorporated into the complex metal oxide.

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