Coating processes – Direct application of electrical – magnetic – wave – or... – Ion plating or implantation
Patent
1995-08-14
1997-07-22
King, Roy V.
Coating processes
Direct application of electrical, magnetic, wave, or...
Ion plating or implantation
427533, 427577, 4272555, 427249, C23C 1448
Patent
active
056502010
ABSTRACT:
A process for depositing carbon nitride films on substrates or work pieces by means of plasma assisted energy controlled ion beam deposition. The process produces microscopically smooth, nearly stress free, insulating and transparent carbon nitride thin films at room (or elevated) temperature. In the process the substrate, tool or other component to be coated is placed in a vacuum chamber at room temperature and is acted upon by a source of negative carbon ions and a high flux plasma source of nitrogen radicals. The source of C.sup.- ions is hydrogen free and provides particle energies suitable for the production of films of high quality carbon nitride. The source of the nitrogen flux provides a high density of nitrogen radicals to interact with the C.sup.- ion beam and coat the substrate with carbon nitride. In a further embodiment of the process, which provides an even higher deposition rate, a source of N.sup.+ is added which provides charge neutralization and surface nitridation prior to deposition.
REFERENCES:
patent: 4664976 (1987-05-01), Kimura et al.
patent: 5110679 (1992-05-01), Haller et al.
patent: 5405515 (1995-04-01), Fang
patent: 5466941 (1995-11-01), Kim
Marton et al, "Synthesis of carbon-nitride film using a fast-switched dual-source low energy ion beam deposition system", Nucl. Instrum. Methods Phys. Res., Sec. B, 90(1-4) pp. 277-281, 1994.
Riviere et al, "Formation of the crystalline beta-C.sub.3 N.sub.4 phase by dual ion beam sputtering deposition", Mater. Lett., 22(1,2) 1995, pp. 115-118.
Experimental Realization Of The Covalent Solid Carbon Nitride, Science vol. 261 (16 Jul.1993) pp. 334-337.
Self-Extraction Negative Ion Source, Rev. Sci. Instrum 53(6) Jun. 1982 pp. 802-809.
Prediction Of New Low Compressibility Solids Science 25 Aug. 1989 p. 841 (Abstract).
"Synthesis And . . . Carbon Nitride As A Novel . . . And Solid Lubricae", Tribology Transactions vol. 36 (1993)p. 491 (Abstract).
Botjer William L.
King Roy V.
Structured Materials Industries Inc.
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