Method for producing an optical waveguide array using a resist m

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making named article

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430330, G03F 700

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active

052309908

ABSTRACT:
The invention relates to an optical waveguide array producing method. The optical waveguide array producing method according to the invention uses an intermediate material forming process for forming an intermediate material of photoresist on a flat sheet, the intermediate material having projections formed in the shape of a predetermined pattern; a resist master forming process of forming a resist master by heating the intermediate material to thereby smooth the surfaces of the projections; an inverted mold forming process for forming an inverted mold having a surface shape that is the inverse of the resist master; a clad portion forming process, for forming a clad portion having grooves equal in sectional shape to the inverted mold, using the inverted mold and also using a first light-transmitting material of a low refractive index; a process for forming core portions by filling the grooves of the clad portion with a second light-transmitting material which is higher in refractive index than the first light-transmitting material; and a process of covering the core portions with a third light-transmitting material lower in refractive index than the first or the second light-transmitting material.

REFERENCES:
patent: 3767445 (1973-10-01), Chandross et al.
patent: 4902086 (1990-02-01), Henry et al.
patent: 5064266 (1991-11-01), Sun et al.
patent: 5113471 (1992-05-01), Inaishi et al.
patent: 5138687 (1992-08-01), Horie et al.
IBM Technical Disclosure Bulletin, vol. 26, No. 10A (Mar. 1984) "Photoresist Reflow Reversal", Badami et al.
English language, abstract of JP 61-138903, "Production of Optical Waveguide", Yoshizawa et al., Jun. 1986.

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