Method for producing a tapered waveguide

Details Method for producing a tapered waveguide Method for producing a tapered waveguide

1994-11-10

1996-11-19

McPherson, John A.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making named article

385 43, 20419226, 4271632, G03C 500

Patent

active

055761496

ABSTRACT:
A method for producing a tapered waveguide layer is disclosed. The method includes the steps of: forming a resist pattern on a substrate; setting the substrate in an apparatus for forming a film such that particles constituting the film reach the substrate from a direction which is oblique relative to the substrate; forming the film on a region of a surface of the substrate which is not covered by the resist pattern, the film having a thickness distribution corresponding to a shadow which the resist pattern creates on the substrate in accordance with an angle between the substrate and the direction; and removing the resist pattern, thereby forming the tapered waveguide layer consisting of the film on the substrate.

REFERENCES:
patent: 4256816 (1981-03-01), Dunkleberger
patent: 5439782 (1995-08-01), Haemmerle et al.
Yamaguchi, N., et al., "Low-loss spot-size transformer by dual tapered waveguides (DTW-SST)" Journal of Lightwave Technology (1990) 8(4):587-593.
Kishioka, K., "Lightwave coupler utilizing a tapered buffer layer" Applied Optics (1988) 27(11):2339-2343.

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