Method for producing a structured layer on a semiconductor...

Details Method for producing a structured layer on a semiconductor... Method for producing a structured layer on a semiconductor...

2005-03-01

2005-03-01

Duda, Kathleen (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

C430S327000, C430S950000

Reexamination Certificate

active

06861206

ABSTRACT:
A method for producing a structured layer on a semiconductor substrate includes the steps of creating the layer on the substrate, modifying a surface of the layer to form a chemically neutral surface, creating an acid-forming photoresist layer on the layer on the substrate, exposing the acid-forming photoresist layer to light for embodying an acid-containing layer in the photoresist layer in accordance with a specified structure of a photoexposure mask, and selectively removing the acid-containing region of the photoresist layer with a lye. The method further includes modifying the surface of the foundation layer for reducing degradation in structuring the acid-forming layer.

REFERENCES:
patent: 20030186537 (2003-10-01), Yamanaka et al.

Affiliated with

Also associated with

Rating

Method for producing a structured layer on a semiconductor... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for producing a structured layer on a semiconductor..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for producing a structured layer on a semiconductor... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3384188