Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1990-03-07
1993-05-11
Thibodeau, Paul J.
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
428900, 428694BP, 427130, 501 51, 501 67, 20419215, C23C 1400, C03C 3155, C03C 3112
Patent
active
052098354
ABSTRACT:
A magnetic recording medium comprising a magnetic recording layer and at least one protective layer formed on the recording layer, wherein the outermost protective layer on the side exposed to air is made of an oxide film.
REFERENCES:
patent: 2150694 (1936-08-01), Morey
patent: 2861000 (1958-11-01), Geffcken et al.
patent: 4268369 (1981-05-01), Barlow et al.
patent: 4386130 (1983-05-01), Hayashi et al.
patent: 4840844 (1989-06-01), Futamoto et al.
patent: 4842956 (1989-06-01), Kobayashi
patent: 4849081 (1989-07-01), Ross
patent: 4898774 (1990-02-01), Yamashita et al.
Ando Ei'ichi
Ebisawa Junichi
Iseda Toru
Makino Ichiro
Matsumoto Kiyoshi
Asahi Glass Company Ltd.
Resan Stevan A.
Thibodeau Paul J.
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