Method for producing a porous coating

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate

Reexamination Certificate

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Details

C427S534000, C257SE21273

Reexamination Certificate

active

10098845

ABSTRACT:
The present invention relates to a process for producing a porous layer adhering to a substrate, which comprises the steps:a. preparation of a composition comprising an organic polymer constituent and an inorganic-organic constituent and/or an inorganic constituent,b. application of this composition to a substrate and formation of a layer on the substrate, andc. removal of the inorganic-organic constituent and/or the inorganic constituent from the layer to form a porous layer adhering to the substrate.

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