Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
Reexamination Certificate
2007-09-25
2007-09-25
Ghyka, Alexander (Department: 2812)
Semiconductor device manufacturing: process
Coating of substrate containing semiconductor region or of...
Insulative material deposited upon semiconductive substrate
C427S534000, C257SE21273
Reexamination Certificate
active
10098845
ABSTRACT:
The present invention relates to a process for producing a porous layer adhering to a substrate, which comprises the steps:a. preparation of a composition comprising an organic polymer constituent and an inorganic-organic constituent and/or an inorganic constituent,b. application of this composition to a substrate and formation of a layer on the substrate, andc. removal of the inorganic-organic constituent and/or the inorganic constituent from the layer to form a porous layer adhering to the substrate.
REFERENCES:
patent: 5103288 (1992-04-01), Sakamoto et al.
patent: 5470801 (1995-11-01), Kapoor et al.
patent: 5776990 (1998-07-01), Hedrick et al.
patent: 0881678 (1998-02-01), None
patent: 10092804 (1998-04-01), None
patent: WO 00/43836 (2000-07-01), None
patent: WO 00/64953 (2000-11-01), None
patent: WO 01/104954 (2001-01-01), None
patent: WO 0104954 (2001-01-01), None
patent: WO 02/071467 (2002-09-01), None
Falbe, et al., Rompp-Lexikon Chemie, vol. 10, p. 205-206, (1996). (No English Translation Available).
Falbe, et al., Rompp-Lexikon Chemie, p. 3037-3039, (1996). (No English Translation Available).
Falbe, et al., Rompp-Lexikon Chemie, p. 2616-2617, (1996). No English Translation Available).
Falbe, et al., Rompp-Lexikon Chemie, p. 1137, (1996). No English Translation Available).
Falbe, et al., Rompp-Lexikon Chemie, p. 4112, (1996). No English Translation Available).
Ghyka Alexander
Infineon - Technologies AG
Jenkins Wilson Taylor & Hunt, P.A.
LandOfFree
Method for producing a porous coating does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for producing a porous coating, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for producing a porous coating will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3739140