Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making named article
Patent
1993-01-29
1994-03-29
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making named article
430320, 430330, 359619, 359620, 359642, 359900, 264 25, G03F 740, B29D 1100
Patent
active
052983668
ABSTRACT:
The invention relates to an optical microlens array producing method. The microlens array producing method according to the invention uses an intermediate material forming process for forming an intermediate material of photoresist on a flat sheet, the intermediate material having projections formed in the shape of a predetermined pattern; a resist master forming process of forming a resist master by heating the intermediate material to thereby smooth the surfaces of the projections; an inverted mold forming process for forming an inverted mold having a surface shape that is the inverse of the resist master; a clad portion forming process, for forming a clad portion having grooves equal in sectional shape to the inverted mold, using the inverted mold and also using a first light-transmitting material of a low refractive index; a process for forming microlenses by filling the concave portion of the clad portion with a second light-transmitting material which is higher in refractive index than the first light-transmitting material microlens with index than the first or the second light-transmitting.
REFERENCES:
patent: 4737447 (1988-04-01), Suzuki et al.
patent: 4966831 (1990-10-01), Mehra et al.
patent: 5079130 (1992-01-01), Derkits, Jr.
patent: 5225935 (1993-07-01), Watanabe et al.
Inaishi Kouji
Iwasaki Takeo
Maruyama Hideo
Shinkai Yuji
Yoshimura Chisato
Bowers Jr. Charles L.
Brother Kogyo Kabushiki Kaisha
McPherson John A.
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