Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate
2008-07-15
2008-07-15
Ghyka, Alexander G (Department: 2812)
Semiconductor device manufacturing: process
Coating with electrically or thermally conductive material
To form ohmic contact to semiconductive material
C438S005000, C438S674000, C257SE21171
Reexamination Certificate
active
07399705
ABSTRACT:
A method for producing at least one local coating on a substrate is provided, as well as a combinatory substrate having such a local coating, a mask that is removable in a non-destructive manner being arranged on the substrate in a first step; the mask having at least one perforation, the perforation being at least partially filled with a reactive solution in a second step; and a coating reaction of the reactive solution with the substrate surface being induced in a third step to form the local coating.
REFERENCES:
patent: 6996550 (2006-02-01), Wang et al.
patent: 2005/0048205 (2005-03-01), Woo et al.
Jockel Jörg
Möller Andreas
Ghyka Alexander G
Kenyon & Kenyon LLP
Robert & Bosch GmbH
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