Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Patent
1995-06-05
1997-09-02
Nguyen, Tuan H.
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
438 3, 438240, 438 79, H01L 2170
Patent
active
056630891
ABSTRACT:
A laminated thin film capacitor having a substrate, at least two electrode layers, at least one dielectric layer and a pair of external electrode which are placed on respective side walls of the capacitor, wherein the metal electrode layer and the dielectric layers are laminated alternately on the substrate, and every other metal electrode layers are exposed on each of side walls of the capacitor, which capacitor is excellent in dielectric properties such as a high capacity per unit volume.
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Fujii Eiji
Fujii Satoru
Hattori Masumi
Takayama Ryoichi
Tomozawa Atsushi
Matsushita Electric - Industrial Co., Ltd.
Nguyen Tuan H.
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