Method for producing a device having a chromium layer

Details Method for producing a device having a chromium layer Method for producing a device having a chromium layer

1997-11-25

1999-11-09

Nguyen, Tuan H.

Semiconductor device manufacturing: process

Coating with electrically or thermally conductive material

To form ohmic contact to semiconductive material

438653, 438656, 438660, H01L 2144

Patent

active

059813890

ABSTRACT:
Chromium layers are deposited on a substrate by means of a sputter deposition process. By using neon as the working gas at pressures of less than 1 Pa, preferably in the range from 0.2 Pa to 0.5 Pa, the sputter-deposited chromium layers are substantially free of internal stress and have a density which is approximately equal to that of bulk chromium.

REFERENCES:
patent: 5084412 (1992-01-01), Nakasaki
patent: 5288658 (1994-02-01), Ishihara
patent: 5656098 (1997-08-01), Ishikawa et al.
patent: 5672243 (1997-09-01), Hsia et al.
patent: 5709938 (1998-01-01), Finley et al.
patent: 5751016 (1998-05-01), Vink et al.
patent: 5883398 (1997-11-01), Vink et al.

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