Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1992-05-27
1996-04-23
Nguyen, Nam
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419216, C23C 1434
Patent
active
055100120
ABSTRACT:
For the production of a coating formed by cathode sputtering, a target made from an alloy of gold and preferably vanadium is used. During the cathode sputtering, nitrogen gas is used as the reactive gas. The result is the formation of vanadium nitrides on the substrate to be coated. By varying the nitrogen content, the proportion of the vanadium nitrides can be changed thereby causing the appearance and the hardness of the coating to also change. This change in coating characteristics can accommodate a broad range of requirements avoiding the necessity of using different targets for different coating characteristics.
REFERENCES:
patent: 4428811 (1984-01-01), Sproul et al.
patent: 4544468 (1985-10-01), Munz et al.
patent: 4591418 (1986-05-01), Snyder
patent: 4791017 (1988-12-01), Hofmann et al.
patent: 4871434 (1989-10-01), Munz et al.
patent: 4882022 (1989-11-01), Hoffman et al.
Edelmetall-Taschenbuch Degussa, Frankfurt am Main, 1967, pp. 111-119.
Belz Alfred
Daube Christoph
Rack Andreas
Schulz Siegfried
Leybold Aktiengesellschaft
Nguyen Nam
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