Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1998-02-13
2000-12-26
Duda, Kathleen
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430327, 134 13, G03F 700
Patent
active
061656941
ABSTRACT:
A method for preventing the formation of recesses in the surface of a borophosphosilicate glass layer comprising the step of first forming a borophosphosilicate glass layer over a substrate, then forming a silicon nitride film having a thickness of about 300.ANG. to 1000.ANG. over the borophosphosilicate glass layer. Next, contact windows are formed, followed by cleaning with an RCA solution. The silicon nitride film provides a protective function preventing the formation of recesses on the borophosphosilicate glass surface. Consequently, no short-circuiting metal bridges caused by metal in the recesses after the deposition of metallic conducting wires are formed.
REFERENCES:
patent: 4732658 (1988-03-01), Lee
patent: 5157002 (1992-10-01), Moon
patent: 5817572 (1998-10-01), Chiang et al.
patent: 5908509 (1999-06-01), Olesen et al.
Duda Kathleen
United Semiconductor Corp.
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