Method for preparing one dimensional spin photonic crystal...

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Reexamination Certificate

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Details

C204S192140, C204S192150, C430S321000, C359S280000

Reexamination Certificate

active

08070919

ABSTRACT:
Provided is a method for preparing a one-dimensional spin photonic crystal device and a one-dimensional spin photonic crystal device prepared by the same. The method comprises forming magnetic and nonmagnetic regions by the interference of laser beams generated from a femtosecond laser light source. The method of the present invention enables production of one-dimensional spin photonic crystals having excellent properties by a rapid and simple process, and is therefore suitable for high integration and large-scale production of desired devices. Further, the prepared photonic crystals exhibit excellent magneto-optical effects and are therefore applicable to development of novel optical devices, and the like.

REFERENCES:
patent: 6545795 (2003-04-01), Matsushita et al.
patent: 7504008 (2009-03-01), Doan et al.
patent: 2004/0100892 (2004-05-01), Horimai
patent: 2005/0255581 (2005-11-01), Kim et al.
patent: 2008/0032237 (2008-02-01), Wong et al.
patent: 2009/0060411 (2009-03-01), Levy et al.
patent: 2000329920 (2000-11-01), None
patent: WO 2006015989 (2006-02-01), None
JP 2000329920 (Japanese Abstract).
JP 2000329920 (Derwent Abstract).

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